In a standard T-NIL process, a thin layer of imprint resist (thermoplastic polymer) is spin coated onto the sample substrate.
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Specific facilities are a clean room for thin film deposition and nanolithography, Sputtering, Pulsed Laser Deposition and Spin Coating as well as lift-off and RIE facilities for lithography, profilometry, Atomic/Magnetic Force Microscopy, SQUID and Magneto Optical Kerr Effect (MOKE) magnetometry, etc.