X-Nico

unusual facts about Tungsten nitride



Atomic layer deposition

ALD can be used to deposit several types of thin films, including various oxides (e.g. ZnO, nitrides (e.g. TiN, TaN, WN, NbN), metals (e.g. Ru, Ir, Pt), and metal sulfides (e.g. ZnS).


see also