These ALD experiments were conducted under the scientific supervision of a corresponding member of the Russian Academy of Sciences Prof. V.B. Aleskovskii.
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ALD can be used to deposit several types of thin films, including various oxides (e.g. ZnO, nitrides (e.g. TiN, TaN, WN, NbN), metals (e.g. Ru, Ir, Pt), and metal sulfides (e.g. ZnS).
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Although the selection of film materials grown by ALD is wide, many technologically important materials (Si, Ge, International Atomic Energy Agency | Atomic bombings of Hiroshima and Nagasaki | United States Atomic Energy Commission | Atomic Kitten | Transport Layer Security | Bhabha Atomic Research Centre | Atomic Betty | Layer Marney | Pakistan Atomic Energy Commission | Bulletin of the Atomic Scientists | Atomic Weapons Establishment | Atomic nucleus | Soviet atomic bomb project | Ned's Atomic Dustbin | Atomic mass unit | Atomic Energy Research Establishment | atomic bombings of Hiroshima and Nagasaki | Atomic | Simple Authentication and Security Layer | Ozone layer | Fused deposition modeling | Electrophoretic deposition | deposition | Brighter than a Thousand Suns: A Personal History of the Atomic Scientists | Atomic number | Atomic Energy of Canada Limited | atomic | The Atomic Cafe | Shippingport Atomic Power Station | Ozone Layer | Similar